发明名称 MASK PATTERN DATA GENERATING SYSTEM AND DATA GENERATION METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a mask pattern data generation system/method having no-return work on the matching work of mask pattern data. SOLUTION: The mask pattern data generating system is provided with a conversion table generation processing means 104 for generating process conversion information from layer information data and shrink information data of a main chip side and a hardware macro side, a conversion information addition processing means 106 adding process conversion information to an arrangement information part as additional information and a conversion processing means 107 converting the process of hardware macro pattern data, based on additional information and outputting mask pattern data of the main chip for mounting the hardware macro of the execution result to an outer storage device are installed as a process conversion means 103, which converts hardware macro pattern data of a manufacturing process different from a main chip loading plural hardware macros into the manufacture process of the main chip and arranges it in the lower-order hierarchy of mask pattern data of the main chip.</p>
申请公布号 JP2001156174(A) 申请公布日期 2001.06.08
申请号 JP19990334611 申请日期 1999.11.25
申请人 NEC IC MICROCOMPUT SYST LTD 发明人 SUZUKI YASUSHI
分类号 H01L21/82;G03F1/68;G03F1/70;G06F17/50;(IPC1-7):H01L21/82;G03F1/08 主分类号 H01L21/82
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