发明名称 LASER BEAM EXPOSURE MARKING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a laser beam exposure marking device which does not require an expensive f.θlens, and maintains satisfactory irradiating position precision, and easily focused the laser beams (about 1/3 times that of the conventional device), and hardly generates a fluctuation in the cross-sectional shape of the laser beams. SOLUTION: A laser light source device is fixed to a platen, and an X/Y stage is arranged on the platen, and a galvanoscanner is mounted on the X/Y scanner of this X/Y stage. Then, laser beams are made incident from a laser light source 1 through mirrors 2, 3, 12, and 14 on the galvanoscanner.</p>
申请公布号 JP2001154139(A) 申请公布日期 2001.06.08
申请号 JP19990339461 申请日期 1999.11.30
申请人 Y E DATA INC;SIGMA TECHNOS KK 发明人 HOSHINO MITSURU;SAKAI NOBUHISA;TANAKA KENJI;GOTO TAKAYUKI;KOIKE HARUHIKO
分类号 B41J2/44;B23K26/00;G02B26/10;G03F7/20;(IPC1-7):G02B26/10 主分类号 B41J2/44
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