发明名称 OPTICAL ELEMENT SUCH AS MULTILAYER FILM REFLECTION MIRROR, PRODUCTION METHOD THEREFOR AND DEVICE USING IT
摘要 A multilayer film reflection mirror capable of simply correcting a wavefront phase, and a production method therefor. A reflection mirror using reflectio n by a multilayer film, wherein the multilayer film is formed with a frequency higher than is necessary for a reflection factor to substantially saturate, and is scraped off according to a wavefront phase regulation amount of an outgoing light to thereby regulate a wavefront phase. Since a correction fil m and a multilayer film having a capability beyond a substantial saturation of a reflection factor are formed, correction is possible by scraping off the multilayer film even when a correction-film removing is not sufficient for phase correction, whereby more accurate phase correction is implemented.</SD OAB>
申请公布号 CA2361519(A1) 申请公布日期 2001.06.07
申请号 CA20002361519 申请日期 2000.08.18
申请人 TOHOKU TECHNO ARCH CO., LTD. 发明人 YAMAMOTO, MASAKI
分类号 G03F7/20;G21K1/06;(IPC1-7):G21K1/06 主分类号 G03F7/20
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