DUAL-STAGE LITHOGRAPHY APPARATUS AND METHOD

摘要

A dual-stage lithography apparatus having increased throughput is disclosed. The apparatus is capable of simultaneous data collection and exposure functions. An embodiment of the disclosed apparatus (100) includes first and second substrate stages (110, 120), each with a corresponding load/unload and data collection stations (140, 150). The apparatus includes a projection optics station (160) located between the load/unload and data collection stations associated with each stage. In this way, data collection of a second stage occurs simultaneously with exposure of the first stage. Once both processes are completed, the two stages move linearly, allowing a simple and fast transition of stages below the exposure apparatus. Also disclosed is a method of performing lithography in which a first substrate is exposed while a second wafer is simultaneously aligned.