RAPID HEAT TREATING APPARATUS

摘要

PURPOSE: A rapid heat treating apparatus is provided to prevent the thermal damage of a reflecting plate and a quartz plate by effectively cooling a heating part on which infrared lamps are mounted by air cooling and water cooling so as to solve the problems of the temperature measuring and controlling and safety of the heat treating apparatus. CONSTITUTION: The rapid heat treating apparatus comprises a process chamber (10) the upper part of which is sealed by a quartz plate (30); a chamber cover (20) covering the upper part of the process chamber (10), wherein grooves are formed in the inner side of the chamber cover (20), and a plurality of holes are formed in the grooves; infrared lamps (60) a plurality of which are installed inside the grooves adjacently to each of the grooves correspondingly thereto so that the infrared lamps (60) are connected to an electric power cable in the outside through the holes; a water cooling pipe (80) installed inside the side wall of the grooves; a reflecting plate (70) installed by being coated on the wall of the grooves so that a light radiated from the infrared lamps (60) is reflected by the reflecting plate (70) to penetrating the quartz plate (30) into the process chamber (10); cooling gas infusing holes (90) installed at the outer side of the chamber cover (20) adjacently to the holes so that gas for cooling can be infused into the grooves through the holes from the outside; and a cooling gas outlet installed at the chamber cover (20) for exhausting the infused gas for cooling.