Method to enhance the formation of nucleation sites on silicon structures and an improved silicon structure

摘要

A method to enhance the formation of nucleation sites on at least one narrow silicon structure comprises the steps: forming at least one nucleation region (206/208); masking the at least one narrow silicon structure (202) with a mask (302); treating the at least one nucleation region (206/208) to enhance an ability of said region to form C54 nucleation sites; and removing the mask from the at least one narrow silicon structure (202).In another embodiment, a semiconductor device capable of undergoing a phase transformation comprises at least one narrow silicon structure (202) formed of TiSi2; and at least one nucleation region (206/208) attached to the at least one narrow silicon structure (202), said at least one nucleation region (206/208) having a width which is greater than a width of said at least one narrow silicon structure (202) and said at least one nucleation region (206/208) capable of generating a high density of C54 nucleation sites such that said high density of nucleation sites causes a phase transformation (502a/502b) to propagate along the at least one silicon structure (202).