POLISHING METHOD, POLISHING DEVICE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING IT

摘要

PROBLEM TO BE SOLVED: To improve instability of polishing efficiency caused by variations in grinding performance of a dresser, in a polishing process. SOLUTION: The grinding resistance to be generated between a polishing pad 6 bonded to a fixed surface plate 7 and a dresser 5 is measured by a grinding resistance sensor 8. Dressing efficiency is calculated in a signal storing and calculating part 9 by using the polishing resistance obtained by the grinding resistance sensor 8 and a specified function, and grinding performance of the dresser 5 is evaluated. The evaluated result is used for selection of the dresser 5.