发明名称 ION IMPLANTER
摘要 PROBLEM TO BE SOLVED: To provide an ion implanter which facilitates attachment and detachment of a shield plate to/from an inner wall of a chamber and prevent any abnormal discharge in the chamber caused by the shield plate. SOLUTION: A shield plate 20 is formed of an elastic sheet metal, elastically deformed into a cylinder, and inserted in the chamber 11, and held in the chamber 11 by pressing the inner wall 11a of the chamber in the radial direction by the restoring force. Even when the diameter of an opening in a flange member 13 on the insertion side is smaller than the inside diameter of the chamber, the shield plate 20 can be easily disposed. No projections are formed inside the chamber 11 by the shield plate 20, and no abnormal discharge is caused thereby inside the chamber 11.
申请公布号 JP2001152334(A) 申请公布日期 2001.06.05
申请号 JP19990338433 申请日期 1999.11.29
申请人 SONY CORP 发明人 NIINA SHUJI;NAKAMURA YOUSUKE
分类号 H01J37/317;C23C14/48;H01L21/265;(IPC1-7):C23C14/48 主分类号 H01J37/317
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