发明名称 METHOD OF FABRICATING FIELD EMISSION DISPLAY
摘要 PURPOSE: A method of fabricating a field emission display is provided which prevents contamination in a panel and employs a white light so as not to require an additional mask to simplify a fabricating process, thereby maintaining high color purity, realizing high resolution and improving display characteristic. CONSTITUTION: A cathode line(61), the first insulating layer(62) and a gate electrode layer(63) are sequentially formed on a transparent substrate(50). The gate electrode layer and the first insulating layer are etched to form a hole exposing a part of the cathode line. Then, a tip(64) is formed on the cathode line inside the hole. A photoresist film is coated on the overall surface of the substrate to bury the hole, exposed and developed to form a photoresist pattern on the hole. Subsequently, the second insulating layer(66) and a focusing electrode layer(67) are formed on the substrate, and the photoresist pattern is stripped to remove the second insulating layer and the focusing electrode layer placed on the photoresist pattern.
申请公布号 KR20010045938(A) 申请公布日期 2001.06.05
申请号 KR19990049469 申请日期 1999.11.09
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KO, IK HWAN;KO, YEONG UK;LEE, GYO UNG;SUNG, UN CHEOL
分类号 H01J1/30;(IPC1-7):H01J1/30 主分类号 H01J1/30
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