ELECTRON CYCLOTRON RESONANCE ASHING APPARATUS FOR PROCESSING GLASS SUBSTRATE OR WAFER

摘要

PURPOSE: An electron cyclotron resonance(ECR) ashing apparatus for processing a glass substrate or wafer is provided to perform a dry ashing process of high efficiency, by fixing the glass substrate of a large area or wafer and by driving a plurality of small ECR sources back and forth or right and left, and by disposing the small ECR sources and driving the glass substrate of a large area or wafer back and forth or right and left. CONSTITUTION: An induction hole for an object, an ashing gas exhausting hole and a gas supplying unit(115) are formed in an ashing chamber(100). The object applied with photoresist(111) is settled in a lower electrode(117) of the ashing chamber. A radio frequency(RF) power is applied to the lower electrode. An electron cyclotron resonance(ECR) source(123) forms plasma in the ashing chamber, composed of a microwave generating unit, a waveguide, a plasma discharging chamber and a magnetic coil. A power supplying apparatus(121) applies power to the ECR source. A scan apparatus(125) drives the ECR source to move back and forth or right and left.