发明名称 |
DEVICE FOR TREATING WASTE GAS CONTAINING VOLATILE ORGANIC MATERIAL |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a waste gas treating device capable of economically and efficiently treating volatile organic material in waste gas. SOLUTION: The waste gas containing volatile organic material is treated by decomposing it using a normal pressure low temperature plasma device such as a normal pressure low temperature microwave plasma device 10 and transferring the treated gas containing undecomposed or secondary produced volatile organic material to a treating means provided with activated carbon such as an activated carbon treating tower to adsorb the volatile organic material.</p> |
申请公布号 |
JP2001149751(A) |
申请公布日期 |
2001.06.05 |
申请号 |
JP19990334274 |
申请日期 |
1999.11.25 |
申请人 |
JAPAN ORGANO CO LTD |
发明人 |
YANO DAISAKU |
分类号 |
B01D53/70;B01D53/32;B01D53/44;B01D53/72;B01D53/81;(IPC1-7):B01D53/70 |
主分类号 |
B01D53/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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