APPARATUS FOR SEALING FLANGE OF HORIZONTAL FURNACE FOR LOW PRESSURE CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: An apparatus for sealing a flange of a horizontal furnace for low pressure chemical vapor deposition(LPCVD) is provided to prevent a vacuum leakage phenomenon and to maintain uniform pressure inside the furnace, by reinforcing a sealing function between a flange and a reaction pipe. CONSTITUTION: A circular type reaction pipe(10) is horizontally formed. A heater(20) has a hot wire(22) for applying heat to the circumference of the reaction pipe. A flange(30) has a coolant pipe(70) buried along the circumference, coupled to front and rear portions of the reaction pipe. A cap(40) is coupled to the outer surface of the flange, capable of being sealed. The first sealing member(50) is inserted into a contact portion of the flange and the cap. The second sealing member(62) is inserted into a common contact portion of the flange, the reaction pipe and the heater. The third sealing member(64) is inserted into a contact portion of the flange and the heater so that dual sealing is capable as the second sealing member is degraded.