| 摘要 |
PURPOSE: An apparatus for extracting organic contaminant of a wafer surface is provided to reduce manufacturing cost by using a general chamber composed of a water bath having a heater, and to heat an organic solution at a uniform temperature by heating and condensing the organic solution in a beaker by an indirect method using water in the water bath. CONSTITUTION: A water bath(4) having a heater constitutes a lower portion of a chamber(1). A beaker(5) is installed in the water bath. A wafer cassette(7) is installed inside the beaker, and a hole is formed on the bottom surface of the wafer cassette.
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