发明名称 Method for electroplating a film onto a substrate
摘要 A method for electroplating a film onto a substrate. Electrical power is supplied to the plating surface through electrical contact made to contact pads on the underside of the substrate. Contact to the contact pads is made within a liquid-tight region. The contact pads are connected to the plating surface through the substrate. Because the contact scheme is provided within a liquid-tight region on the underside of the substrate, the contacts do not erode or become plated, nor do they consume an area of the plating surface.
申请公布号 US6241868(B1) 申请公布日期 2001.06.05
申请号 US20000541018 申请日期 2000.03.31
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BIGGS GLEN N.;BREWER DONALD M.;FLUEGEL JAMES E.;KAJA SURYANARAYANA;MALHOTRA ASHWANI K.;PALMATIER PHILLIP W.
分类号 C25D7/12;C25D17/00;H05K3/24;(IPC1-7):C25D5/02 主分类号 C25D7/12
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