发明名称 APPARATUS FOR CLEANING PARTS OF SEMICONDUCTOR EQUIPMENT
摘要 PURPOSE: An apparatus for cleaning parts of semiconductor equipment is provided to prevent environmental pollution of a workplace and to shorten cleaning time, by automatically spraying cleaning solvent of a solid particle type to clean an object, and by making a work table and a spray nozzle assembly controlled to be transferred horizontally, revolved and transferred vertically. CONSTITUTION: A case(3) has a cleaning chamber(1) where an object to clean is contained. The object to clean is settled on a work table(5) located on the lower surface of the cleaning chamber. A work table horizontal transfer unit horizontally transfers the worktable, disposed in the case. A worktable-revolving unit revolves the worktable, disposed in the case. A spray nozzle assembly(23) sprays solvent of a solid particle type to the object placed on the worktable, disposed in the case. A spray nozzle vertical transfer unit vertically transfers the spray nozzle assembly, disposed in the case. A control unit controls the word table horizontal transfer unit, the worktable-revolving unit and the spray nozzle vertical transfer unit, disposed in the case.
申请公布号 KR20010045992(A) 申请公布日期 2001.06.05
申请号 KR19990049550 申请日期 1999.11.09
申请人 K.C. TECH CO., LTD. 发明人 KIM, JIN YONG;KIM, SI HONG;LEE, HONG RYEOL
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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