BOAT CAP OF VERTICAL DIFFUSION FURNACE FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A boat cap of a vertical diffusion furnace for manufacturing a semiconductor device is to provide a uniform layer of an excellent quality regarding the entire surface of a wafer, by making reaction gas of a uniform quantity flow and maintaining a uniform distribution space of a temperature. CONSTITUTION: Vertical surfaces in parallel with a flat zone(42) of a wafer(40) are formed in a reaction pipe(10), upper and lower plates(32,34) of a boat(30) and a boat cap(50) so that reaction gas does not flow to the flat zone of the wafer intensively. Vertical surfaces in parallel with the flat zone of the wafer are formed in at least the inner surface of a heater so that a uniform temperature is used regarding the entire surface of the wafer.