发明名称 BOAT CAP OF VERTICAL DIFFUSION FURNACE FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PURPOSE: A boat cap of a vertical diffusion furnace for manufacturing a semiconductor device is to provide a more stable structure in terms of process quality and function, by remarkably reducing the number of parts, and by improving a sealing property. CONSTITUTION: A plurality of wafers(4) are stacked in a boat(3). The boat is placed on a boat cap(50). Pluralities of fixing pins(52) are formed as one body with the boat cap, protruded on the upper surface of the boat cap to fix the boat. Spaces are vertically formed on the inner surface of a plurality of radiating plates(54), having a predetermined interval.
申请公布号 KR20010045166(A) 申请公布日期 2001.06.05
申请号 KR19990048360 申请日期 1999.11.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, YUN SIK
分类号 H01L21/22;(IPC1-7):H01L21/22 主分类号 H01L21/22
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