| 摘要 |
A method for manufacturing a color filter by thermal transfer using a laser beam with uniform energy distribution. The method includes forming a black matrix pattern on a substrate by photolithography. A transfer film having thermal color layers is placed on the substrate, and a laser beam with uniform energy distribution irradiates the transfer film to transfer the color layers onto the substrate. The substrate onto which the color layer has been transferred, is cured at 200~300° C. Therefore, by using the laser beam with uniform energy distribution, or a laser beam which scans by dithering, for the thermal transfer, the quality of an image formed at the edges of the is improved and the surface roughness is reduced, resulting in an excellent color filter.
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