Device for corpuscular beam exposure subjects pattern on specimen to corpuscular beam whilst feeding low pressure ozone into vacuum chamber at pressure below that of the atmosphere

摘要

The device subjects a pattern on a specimen to a corpuscular beam whilst feeding low pressure ozone into at least one area of a vacuum chamber. The method involves the generation of ozone at a pressure below that of the atmosphere. The device contains a vacuum chamber, a vacuum pump, corpuscle beam optics and an ozone delivery mechanism. Independent claims are also included for the following: a corpuscular beam exposure method.