发明名称 SILICON NANOPARTICLE AND METHOD FOR PRODUCING THE SAME
摘要 A silicon nanoparticle having unique properties and being a source of stimulated emissions that also be suspend in liquids and solids is provided by the invention. It can be formed into crystals, clusters, colloids and films. The nanoparticle is dimensioned on an order of magnitude of 1 and not exceeding about 2 nanometers. The method of producing the silicon nanopartic le of the invention comprises placing a silicon wafer (10) and a platinum catho de (12), in the form of a sheet or a wire, in an etchant bath (14), consisting of HF acid, H2O2 liquid and other chemicals, having a surface (20). The wafer a nd the cathode are connected to a constant current source (16) driven by a powe r source (18). The silicon wafer (10) is gradually immersed into the bath. A magnetic stirrer (22) ensures that the chemicals of the etchant bath stay uniformly mixed.
申请公布号 CA2388815(A1) 申请公布日期 2001.05.31
申请号 CA20002388815 申请日期 2000.10.20
申请人 THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS 发明人 THERRIEN, JOEL;YAMANI, ZAIN H.;NAYFEH, MUNIR H.
分类号 B82B3/00;C01B33/02;C01B33/021;C25F3/12;G02B6/02;G02B6/10;H01L29/06;H01L29/66;H01S3/16;H01S5/04;H01S5/10;H01S5/30;(IPC1-7):C01B33/02 主分类号 B82B3/00
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