发明名称 |
Low pressure vapor phase deposition of organic thin films |
摘要 |
Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies.
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申请公布号 |
US2001002279(A1) |
申请公布日期 |
2001.05.31 |
申请号 |
US20000736090 |
申请日期 |
2000.12.13 |
申请人 |
FORREST STEPHEN R.;BURROWS PAUL E.;BAN VLADIMIR S. |
发明人 |
FORREST STEPHEN R.;BURROWS PAUL E.;BAN VLADIMIR S. |
分类号 |
H05B33/10;C23C16/00;C23C16/30;H01L51/00;H01L51/30;H01L51/40;H01L51/50;(IPC1-7):C23C16/00 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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