发明名称 Low pressure vapor phase deposition of organic thin films
摘要 Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies.
申请公布号 US2001002279(A1) 申请公布日期 2001.05.31
申请号 US20000736090 申请日期 2000.12.13
申请人 FORREST STEPHEN R.;BURROWS PAUL E.;BAN VLADIMIR S. 发明人 FORREST STEPHEN R.;BURROWS PAUL E.;BAN VLADIMIR S.
分类号 H05B33/10;C23C16/00;C23C16/30;H01L51/00;H01L51/30;H01L51/40;H01L51/50;(IPC1-7):C23C16/00 主分类号 H05B33/10
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