发明名称 |
Electron beam measurement method and electron beam irradiation processing device |
摘要 |
An electron beam irradiation processing device including an electron beam tube (1) and a current detection unit (11a) disposed outside of the window (1d) of the electron beam tube. The electron beam tube is adapted to radiate electron beams and has a window and an associated power-source unit that provides a power source (2). The current detection unit includes at least one of a conductor and a semiconductor covered by an insulating film, and an electron beam level measurement unit having a current measurement unit that measures the current flowing through the current detection unit. The amount of electron beams output from the electron beam tube is controlled by controlling the power-source unit as a function of the current flowing through the current detection unit. In addition, a method of measuring amount of electron beams radiated from an electron beam tube with a window including the steps of providing a current detection unit and measuring amount of electron beams radiated from the electron beam tube by measuring the current flowing through the current detection unit. <IMAGE> |
申请公布号 |
EP1104002(A1) |
申请公布日期 |
2001.05.30 |
申请号 |
EP20000125780 |
申请日期 |
2000.11.24 |
申请人 |
USHIODENKI KABUSHIKI KAISHA |
发明人 |
KOMORI, MINORU;YAMAGUCHI, MASANORI |
分类号 |
H01L21/027;G01R19/00;H01J7/44;H01J33/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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