发明名称 |
Method for obtaining an extreme ultraviolet radiation source, radiation source and use in lithography |
摘要 |
Method for obtaining extreme ultraviolet radiation and a source thereof, application in lithography. According to the invention, at least a solid target ( 28 ) is used, emitting extreme ultraviolet radiation by interaction with a laser beam focussed on a face ( 30 ) of the target. This target is able to emit a portion of the radiation from the opposite face ( 37 ) and this portion is collected and transmitted. |
申请公布号 |
AU1712301(A) |
申请公布日期 |
2001.05.30 |
申请号 |
AU20010017123 |
申请日期 |
2000.11.14 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
DANIELE BABONNEAU;REMY MARMORET;LAURENCE BONNET |
分类号 |
G21K5/08;G03F7/20;G21K5/02;G21K7/00;H01L21/027;H05G2/00 |
主分类号 |
G21K5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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