| 发明名称 |
Imaging method using phase boundary masking with modified illumination |
| 摘要 |
A projection lithography system provides a cross-quadrupole illumination pattern in combination with a translucent substrate having boundary relief features. The features are spaced close together so that they are not imaged in a focal plane, but generate a dark image of the space between the features in the focal plane. |
| 申请公布号 |
AU1610501(A) |
申请公布日期 |
2001.05.30 |
| 申请号 |
AU20010016105 |
申请日期 |
2000.11.15 |
| 申请人 |
LITHOGRAPHIC TECHNOLOGY CORPORATION |
发明人 |
BRUCE W. SMITH;JOHN S. PETERSON |
| 分类号 |
G02B27/46;G03F1/00;G03F7/20;H01L21/027 |
主分类号 |
G02B27/46 |
| 代理机构 |
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代理人 |
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