发明名称 PROCESS FOR MAKING COMPOSITIONS FOR PURIFYING SEMICONDUCTOR PROCESS GASES TO REMOVE LEWIS ACID AND OXIDANT IMPURITIES THEREFROM
摘要 Scavenger compositions useful for purifying process gas streams, such as process gas streams, such as hydrogen, nitrogen, noble gases, diborane, and hydride gases from Groups IVA-VIA of the Periodic Table, such as arsine, phosphine, silane, germane, hydrogen selenide, and hydrogen telluride, and mixtures thereof, to remove water, oxygen, and other oxidant and Lewis acid impurities therefrom, such scavenger comprising a porous, high surface area inert support having thereon an active scavenging species, formed by the deposition on the support of a Group IA metal and pyrolysis thereof at a selected elevated temperature on said support. In another aspect, the present invention relates to a method of making a scavenger useful for purifying process gas streams, to remove water, oxygen, and other oxidant and Lewis acid impurities therefrom, and a process for purifying process gas streams to remove water, oxygen, and other oxidant and Lewis acid impurities therefrom, such process comprising contacting the impurity-containing process gas stream with a scavenger of the general type described above. In a further aspect, the invention relates to a method for using scavengers of the general type described above as back-diffusion scrubbers to protect the manufacturing process or gas supply system from inadvertent introduction of impurities, such method comprising contacting the impurity-containing process gas stream with a scavenger of the general type described above and providing in the scavenger bed one or more endpoint detectors so that back-diffusion events are observed.
申请公布号 EP0714425(B1) 申请公布日期 2001.05.30
申请号 EP19940923268 申请日期 1994.06.28
申请人 MILLIPORE INVESTMENT HOLDINGS LIMITED 发明人 TOM, GLENN, M.;MCMANUS, JAMES, V.
分类号 B01D53/02;B01D53/28;B01D53/40;B01D53/46;B01J20/02;B01J20/04;B01J20/26;E02F9/22;F15B11/05;F15B11/16;F15B21/08 主分类号 B01D53/02
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