发明名称 Method of uniformly coating a substrate
摘要 A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
申请公布号 US6238735(B1) 申请公布日期 2001.05.29
申请号 US19990391964 申请日期 1999.09.08
申请人 SILICON VALLEY GROUP, INC. 发明人 MANDAL ROBERT P.;GRAMBOW JAMES C.;DETTES TED C.;SAUER DONALD R.;GURER EMIR;WARD EDMOND R.
分类号 G03F7/16;B01J19/00;B05C5/00;B05C11/06;B05D1/00;B05D3/04;G03F1/16;H01L21/00;H01L21/027;(IPC1-7):B05D3/12 主分类号 G03F7/16
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