| 摘要 |
PROBLEM TO BE SOLVED: To improve a positioning accuracy by suppressing a vibration in a projection optical system and to contribute to the improvement in a pattern projecting accuracy. SOLUTION: The aligner 1 for exposing a substrate W with a pattern of a mask R comprises a projection optical system PL for projecting the substrate W with the pattern, a holding member 34 for holding the system PL, a detector 38 for detecting information regarding the displacement of the system PL, an actuator 36 provided at the member 34, and a driver 37 for driving the actuator 36 in response to the detected result of the detector 38. |
