发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device and a manufacturing method capable of improving the adhesion on an interlayer dielectric of the wiring of a narrow wiring width, preventing the falling and peeling of the wiring and performing manufacture at a low cost. SOLUTION: The irregularities of prescribed height are formed on the surface of the interlayer dielectric on a semiconductor substrate where a semiconductor element is formed and the wiring is formed on the irregularities.
申请公布号 JP2001148420(A) 申请公布日期 2001.05.29
申请号 JP19990328862 申请日期 1999.11.18
申请人 NEC IC MICROCOMPUT SYST LTD 发明人 NASU TERUHIRO
分类号 H01L21/768;H01L23/522;(IPC1-7):H01L21/768 主分类号 H01L21/768
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