发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device and a manufacturing method capable of improving the adhesion on an interlayer dielectric of the wiring of a narrow wiring width, preventing the falling and peeling of the wiring and performing manufacture at a low cost. SOLUTION: The irregularities of prescribed height are formed on the surface of the interlayer dielectric on a semiconductor substrate where a semiconductor element is formed and the wiring is formed on the irregularities.
|
申请公布号 |
JP2001148420(A) |
申请公布日期 |
2001.05.29 |
申请号 |
JP19990328862 |
申请日期 |
1999.11.18 |
申请人 |
NEC IC MICROCOMPUT SYST LTD |
发明人 |
NASU TERUHIRO |
分类号 |
H01L21/768;H01L23/522;(IPC1-7):H01L21/768 |
主分类号 |
H01L21/768 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|