Positive photosensitive composition

摘要

An object of the present invention is to provide a positive photosensitive composition suitable for use with an exposure light having a wavelength of 250 nm or shorter, especially 220 nm or shorter. The positive photosensitive composition comprises (A) a compound which generates an acid upon irradiation with actinic rays or a radiation, (B) a resin having monovalent polyalicyclic groups represented by at least one of the following general formulae (I), (II), and (III) and further having groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution, and (C) a compound represented by the following general formula (CI) or (CII) or a low-molecular compound (i) comprising one or more hydrophilic functional groups and an internally crosslinked hydrocarbon group having from 5 to 30 carbon atoms or a naphthalene compound (ii) having one or more hydrophilic functional groups and from 10 to 30 carbon atoms:wherein the substituents are as defined in the specification.