发明名称 |
Ceria powder |
摘要 |
A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.
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申请公布号 |
US6238450(B1) |
申请公布日期 |
2001.05.29 |
申请号 |
US20000553968 |
申请日期 |
2000.04.21 |
申请人 |
SAINT-GOBAIN INDUSTRIAL CERAMICS, INC. |
发明人 |
GARG AJAY K.;TANIKELLA BRAHMANANDAM V.;KHAUND ARUP |
分类号 |
B24B37/00;C01F17/00;C09K3/14;H01L21/304;H01L21/306;(IPC1-7):C04B35/50 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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