发明名称 Electron beam plasma formation for surface chemistry
摘要 One or more electron beam tubes are arranged to direct electron beams in air or other ambient gas toward a target object. The electron beams ionize air producing a plasma or glow discharge. An electric or magnetic field in the beam trajectory sustains the plasma by trapping secondary electrons formed by collisions of beam electrons with the ambient atmosphere. Target objects may be placed in the field for surface treatment, such as sterilization, or for thin film growth. In the latter case, the apparatus is enclosed in a housing and a reactive gas is introduced into the beam trajectory. The gas is one which is crackable by the electron beam or plasma, such as an organic silicon compound which would liberate silicon for combination with ionized oxygen to form silicon dioxide layers on a substrate.
申请公布号 US6239543(B1) 申请公布日期 2001.05.29
申请号 US19990379543 申请日期 1999.08.23
申请人 AMERICAN INTERNATIONAL TECHNOLOGIES, INC. 发明人 WAKALOPULOS GEORGE
分类号 G21K5/04;A61L2/08;A61L2/14;B01J19/08;B29C35/08;B29C59/14;B29C59/16;C23C16/48;H01J33/02;H01L21/31;H05H1/24;(IPC1-7):H01J37/30;H01J33/00 主分类号 G21K5/04
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