发明名称 PHOTOSENSITIVE COMPOSITION AND PRODUCTS OF CURING THEREOF
摘要 A photosensitive composition, characterized by comprising a prepolymer (A) bearing at least two polymerizable unsaturated groups and at least one carboxyl group in one molecule, a photopolymerization initiator (B), a reactive diluent (C), and a blocked isocyanate (D). It is preferable that the components (B), (C) and (D) are contained in amounts of 1 to 30, 1 to 100, and 2 to 100 parts by weight respectively per 100 parts by weight of the component (A). The composition can give, via irradiation with actinic radiation, cured films which are excellent not only in developability, curing properties, stability, and resistance of exposed areas to developer, but in properties necessary to solder resists, e.g., close adhesion, insulation properties, resistance to soldering heat, resistances to solvent, acid and alkali, and plating resistance.
申请公布号 WO0137048(A1) 申请公布日期 2001.05.25
申请号 WO2000JP08026 申请日期 2000.11.14
申请人 MITSUBISHI CHEMICAL CORPORATION;KUSAKA, HISASHI;HATA, KAZUYUKI;SOEJIMA, YUUJI 发明人 KUSAKA, HISASHI;HATA, KAZUYUKI;SOEJIMA, YUUJI
分类号 C08G18/08;C08G18/80;G03F7/027;(IPC1-7):G03F7/027;G03F7/035 主分类号 C08G18/08
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