发明名称 |
COATING SOLUTION FOR FORMING PHOTOSENSITIVE TRANSPARENT CONDUCTIVE FILM, PATERNIZED TRANSPARENT CONDUCTIVE FILM AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a coating solution that can form a film having a high transparency, a high conductivity and an excellent mechanical strength in a low cost, an excellent stability and a very simple process as a coating solution for forming photosensitive transparent conductive film. SOLUTION: In a coating solution for forming a photosensitive transparent conductive film including an ultraviolet rays hardening type or an ultraviolet rays collapse type of photosensitive resin and solvent, it permits a chelate complex coordinated with an organic coordination to be included into a combination including indium (In) and tin (Sn) as a material for forming a transparent conductive film and a hydroxy compound created from an organic acid. It creates a transparent conductive film patternized by being developed into an alkali aqueous solution and by burning above 500 deg.C after coating and drying the coating solution on the substrate, arranging a photo mask on the drying film, and irradiating an ultraviolet rays and exposing to the light.
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申请公布号 |
JP2001143526(A) |
申请公布日期 |
2001.05.25 |
申请号 |
JP19990326107 |
申请日期 |
1999.11.16 |
申请人 |
SUMITOMO OSAKA CEMENT CO LTD |
发明人 |
ISHIKAWA MASAAKI;YOSHIKAWA TOSHIHARU |
分类号 |
H01B1/20;G02F1/1343;H01B5/14;(IPC1-7):H01B1/20 |
主分类号 |
H01B1/20 |
代理机构 |
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代理人 |
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地址 |
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