发明名称 COATING SOLUTION FOR FORMING PHOTOSENSITIVE TRANSPARENT CONDUCTIVE FILM, PATERNIZED TRANSPARENT CONDUCTIVE FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a coating solution that can form a film having a high transparency, a high conductivity and an excellent mechanical strength in a low cost, an excellent stability and a very simple process as a coating solution for forming photosensitive transparent conductive film. SOLUTION: In a coating solution for forming a photosensitive transparent conductive film including an ultraviolet rays hardening type or an ultraviolet rays collapse type of photosensitive resin and solvent, it permits a chelate complex coordinated with an organic coordination to be included into a combination including indium (In) and tin (Sn) as a material for forming a transparent conductive film and a hydroxy compound created from an organic acid. It creates a transparent conductive film patternized by being developed into an alkali aqueous solution and by burning above 500 deg.C after coating and drying the coating solution on the substrate, arranging a photo mask on the drying film, and irradiating an ultraviolet rays and exposing to the light.
申请公布号 JP2001143526(A) 申请公布日期 2001.05.25
申请号 JP19990326107 申请日期 1999.11.16
申请人 SUMITOMO OSAKA CEMENT CO LTD 发明人 ISHIKAWA MASAAKI;YOSHIKAWA TOSHIHARU
分类号 H01B1/20;G02F1/1343;H01B5/14;(IPC1-7):H01B1/20 主分类号 H01B1/20
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