首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
EXPOSURE APPARATUS, SEMICONDUCTOR DEVICE, AND PHOTOMASK
摘要
申请公布号
KR20010043714(A)
申请公布日期
2001.05.25
申请号
KR1020007012958
申请日期
2000.11.18
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
您可能感兴趣的专利
MICROBICIDE SUBSTANCES
SUPERPOSITION OF WAVES USING THE CORDIC ALGORITHM
SPLITTABLE MULTIPLE CATHETER ASSEMBLY
METHOD OF PRODUCING A MOVABLE LENS STRUCTURE FOR A LIGHT SHAPING UNIT
RE-SEALABLE CONTAINER
PROCESS AND APPARATUS FOR THE TREATMENT OF SALINE WATER
METHOD FOR COATING, PRETREATMENT COMPOSITION BEFORE ELECTROSTATIC COATING, AND ARTICLES MADE THEREFROM
LONG-LASTING STYLING MOUSSE.
MILK-AND-SUGAR BASED POWDER PRODUCT, METHOD AND USES.
POLYESTER MOLDING COMPOSITION.
CAPILLARY ACTION TRANSFER PINS
ARGON PURIFICATION PROCESS.
TAMPER EVIDENCING CLOSURE.
BRUSH FOR APPLYING A PRODUCT ON KERATIN FIBRES.
TEXTURE MASKED PARTICLES CONTAINING AN ACTIVE INGREDIENT.
COMPOSITIONS AND METHODS FOR INSECT CONTROL
AIR-INSULATED HIGH-VOLTAGE DISCONNECTOR.
PROPORTIONAL BAND TEMPERATURE CONTROL FOR ONE OR MORE HEATING ELEMENTS.
GARMENT HANGER WITH NON-ALIGNED GARMENT STOP.
BIOLUMINESCENCE REGENERATIVE CYCLE (BRC) FOR NUCLEIC ACID QUANTIFICATION