| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent an increase in a manufacturing cost and an increase in the manufacturing cost in terms of mass production of masks by eliminating the need for fresh addition of a stage for utilizing the vapor of a solution essentially consisting of hydrofluoric acid or the vapor of the hydrofluoric acid after forming recessed parts of shifter parts by dry etching and eliminating the need for respective stages for etching, washing and drying. SOLUTION: The grooves of the recessed shapes disposed at a transparent substrate of the shifter parts are formed by regulating the bias voltage in the dry etching to >=-50 V and <=-85 V.</p> |
