| 摘要 |
PROBLEM TO BE SOLVED: To provide an excellent optical projection lens system for photolithography. SOLUTION: A first lens group G1 having a positive refracting power, a second lens group G2 which has a negative refracting power and consists of a waist 37 having a minimum diameter of radiation to be propagated, and another lens array G3 which is arranged following the second lens group and has a positive refracting power are provided in the propagation direction, and a lens having an aspherical surface 31 is arranged in front of the waist 37.
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