| 摘要 |
PROBLEM TO BE SOLVED: To maintain control precision of exposure amount high and prevent deterioration of throughput in the case that exposure is performed by using target exposure amounts which are different from each other on a plurality of regions on a substrate, when scanning exposure is performed by using a pulse light source. SOLUTION: By using a pulse light from an excimer laser light source 1, scanning exposure is performed to shot regions on a plurality of subregions on a wafer 14 with target exposure amounts which are different from each other. Transmissivity of an energy coarse control device 3 having a plurality of ND filters is so set that at least a specified number of minimum exposure pulses can be obtained in the subregion wherein the number of exposure pulses becomes minimum. Transmissivity of the energy coarse control device 3 is fixed during scanning exposure. In order to correct irregularity of pulse energy, output of the excimer laser light source 1 is controlled on the basis of a measured value of an integrator sensor 25. |
