发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING SAME AND METHOD FOR PRODUCING COLOR FILTER
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which ensures easy peelability of a film, easily forms a hardly stepped high accuracy pattern in a good yield and is suitable for use in the production of a color filter. SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated bond in one molecule, (C) a photopolymerization initiator and (D) and extender. A support film (a), a cushion layer (b) and a layer (c) of the photosensitive resin composition are successively laminated to obtain the objective photosensitive element. Steps including a step for sticking the photosensitive element to a transparent substrate in such a way that the layer (c) comes in contact with the top of the substrate, a step for peeling the support film (a) and the cushion layer (b) and a step for patternwise exposing and developing the layer (c) are repeated to form a multicolored pattern and the objective color filter is produced.
申请公布号 JP2001142201(A) 申请公布日期 2001.05.25
申请号 JP19990326238 申请日期 1999.11.17
申请人 HITACHI CHEM CO LTD 发明人 SAITO MANABU;FURUBAYASHI HIROMI;TANIGAWA TADAHIRO;IGARASHI YOSHIZO
分类号 G03F7/004;G02B5/20;G03F7/027;G03F7/032 主分类号 G03F7/004
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