| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pattern plate drawn with alignment patterns and a regular pattern with the good accuracy in the position relations of these patterns with the decreased distortions of the regular pattern. SOLUTION: When the pattern plate having the regular pattern B, such as a reticle pattern or shadow mask pattern, and the alignment patterns A1, A2 and A3 is drawn, the alignment patterns A1, A2 and A3 of a final product are previously formed on a substrate 1 and a photosensitive layer 2 is applied on the substrate 1. The positions of the alignment patterns A1, A2 and A3 of the substrate 1 are then read and the regular pattern B is drawn while the relative position of the drawing beam is controlled to these positions. The alignment patterns A1, A2 and A3 are formed to be used also as the alignment patterns of a reticle mask which is a final product.</p> |
