| 摘要 |
PROBLEM TO BE SOLVED: To prevent focus error and overlay error which are to be caused by contaminating particles existing between a retaining surface and a back of a substrate. SOLUTION: This lithograph projecting equipment consists of irradiating devices LA, EX, IN and CO for supplying an irradiation projection beam PB, a first material table MT for holding a mask MA, a second material table WT having a retaining surface for retaining and holding a substrate W, and a projector PL for forming an image of an irradiated part of the mask MA on a target of the substrate W. A contamination detecting means is disposed which is so constituted and arranged that existance of contamination on either one or both of a retaining surface and the back of the substrate is detected.
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