NITRILE/FLUOROALCOHOL-CONTAINING PHOTORESISTS AND ASSOCIATED PROCESSES FOR MICROLITHOGRAPHY
摘要
Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography are described. These photoresists are comprised of a fluoroalcohol functional group and a nitrile-containing compound which together simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.
申请公布号
WO0137047(A2)
申请公布日期
2001.05.25
申请号
WO2000US31136
申请日期
2000.11.14
申请人
E.I. DU PONT DE NEMOURS AND COMPANY;FRYD, MICHAEL;SCHADT, FRANK, LEONARD, III;PERIYASAMY, MOOKKAN