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发明名称
CHEMICAL MECHANICAL POLISHING SLURRY USEFUL FOR COPPER SUBSTRATES
摘要
申请公布号
KR20010041962(A)
申请公布日期
2001.05.25
申请号
KR1020007010286
申请日期
2000.09.18
申请人
发明人
分类号
C09G1/02
主分类号
C09G1/02
代理机构
代理人
主权项
地址
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