发明名称 PLASMA FOCUS LIGHT SOURCE WITH IMPROVED PULSE POWER SYSTEM
摘要 <p>A high energy photon source. A pair of plasma pinch electrodes (8) are located in a vacuum chamber in a plasma pinch unit (2). The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to produce a desired spectral line. A pulse power source (10) provides electrical pulses at high enough voltages to create electrical discharges between the electrodes. This produces high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source. The electrodes are configured coaxially with the anode on the axis. Active gas is introduced through the hollow anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas.</p>
申请公布号 WO2001037309(A1) 申请公布日期 2001.05.25
申请号 US2000029750 申请日期 2000.10.26
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