A METHOD FOR DEPOSITING LAYERS ON A SUBSTRATE

摘要

A method is disclosed for depositing layers, e.g. by Plasma Enhanced Chemical Vapour Deposition (PECVD), on a substrate, improves the stability of PECVD chambers when used for the fabrication of planar waveguide components. The method, which comprises that a substrate is placed on a carrier that is placed on the bottom electrode, improves the plasma cleaning process by substantially reducing build up of polymers during cleaning. Overall the method reduces chamber downtime and improves chamber parameter control and hence also improves control over deposited film parameters such as refractive index. In an embodiment of the invention the carrier is constituted of two parts, namely an outer carrier with a hole, and an inner carrier that fits in the hole.