发明名称 |
SYSTEM AND METHOD FOR REMOVAL OF MATERIAL |
摘要 |
Apparatus and method for removal of material in reactions having limited solubility and diffusion. A flow apparatus is provided for removal of material from a work piece having at least one reaction region containing removable material. The apparatus may include first and second assemblies positionable in spaced-apart relation to form a zone extending between the two assemblies for movement of gaseous material. The first assembly may include a fixture positioned to receive the work piece with the reaction region of the work piece disposed in the zone to allow movement of the gaseous material thereover. A flow assembly is configured to transfer into the zone a gas comprising a condensable material and a reacting species. In a method for chemical processing the thickness of a layer of condensate on a surface is actively controlled and a reactant species is diffused from a gaseous region overlying the surface into the layer. According to an exemplary embodiment a workpiece is placed in an atmosphere comprising a condensable gas and a reacting species and the partial pressure of the condensable gas is controlled to limit the formation of liquid condensation on the surface region. |
申请公布号 |
WO0137329(A1) |
申请公布日期 |
2001.05.25 |
申请号 |
WO2000US31164 |
申请日期 |
2000.11.14 |
申请人 |
LUCENT TECHNOLOGIES, INC. |
发明人 |
HIGASHI, GREGG, S. |
分类号 |
H01L21/00;H01L21/306;H01L21/311 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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