发明名称 SYSTEM AND METHOD FOR REMOVAL OF MATERIAL
摘要 Apparatus and method for removal of material in reactions having limited solubility and diffusion. A flow apparatus is provided for removal of material from a work piece having at least one reaction region containing removable material. The apparatus may include first and second assemblies positionable in spaced-apart relation to form a zone extending between the two assemblies for movement of gaseous material. The first assembly may include a fixture positioned to receive the work piece with the reaction region of the work piece disposed in the zone to allow movement of the gaseous material thereover. A flow assembly is configured to transfer into the zone a gas comprising a condensable material and a reacting species. In a method for chemical processing the thickness of a layer of condensate on a surface is actively controlled and a reactant species is diffused from a gaseous region overlying the surface into the layer. According to an exemplary embodiment a workpiece is placed in an atmosphere comprising a condensable gas and a reacting species and the partial pressure of the condensable gas is controlled to limit the formation of liquid condensation on the surface region.
申请公布号 WO0137329(A1) 申请公布日期 2001.05.25
申请号 WO2000US31164 申请日期 2000.11.14
申请人 LUCENT TECHNOLOGIES, INC. 发明人 HIGASHI, GREGG, S.
分类号 H01L21/00;H01L21/306;H01L21/311 主分类号 H01L21/00
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