ILLUMINATION DEVICE FOR MACROINSPECTION, APPARATUS AND METHOD FOR MACROINSPECTION

摘要

PROBLEM TO BE SOLVED: To provide an illumination device for macroinspection, by which whether a defocus defect or the like is contained on the face to be fine worked of a resist pattern or the like formed on a semiconductor substrate such as a wafer or the like can be inspected especially visually and clearly, and to provide an apparatus and a method for inspection in which the obtained illumination device for macroinspection is used. SOLUTION: This macroinspection apparatus 10 comprises an illumination device 12 for macroinspection, which is equipped with a light source used to irradiate coherent light 14. The macroinspection apparatus comprises a support means 20 used to support a substrate 18 which is irradiated with the coherent light 14 from the illumination device 12 for macroinspection and on which the face 16 to be fine worked of a prescribed pattern is formed. The macroinspection apparatus comprises a judgment means 24 in which whether a pattern formed on the substrate 18 is deformed from the prescribed pattern is judged by diffracted light 22 from the face 16 to be fine worked. The illumination device 12 for macroinspection is constituted of a device which irradiates light containing coherent light in two colors in the relationship of complementary colors.