发明名称 MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a manufacturing method of an electro-optical device such as a liquid crystal device which is high in contrast and bright in display by reducing the alignment irregularities of electrochemical substance due to a step difference of a substrate surface and the alignment irregularities of the electro-optical substance due to a transverse electric field. SOLUTION: In the electro-optical device, a resist mask is formed on a TFT array substrate 10, and thereafter, an etching is performed in an etching gas environment containing oxygen, thereby, the resist mask is subjected to the etching and, at the same time, the surface of TFT array substrate 10 is subjected to the etching. As a result, a recessed part 201 which has a side surface part 202 which is a tapered surface is formed on the TFT array substrate 10 and, therefore, the region where data lines 6a are formed is flattened. Also, since in the TFT array substrate 10, a projecting part 301 which has a side surface part 302 which is a tapered surface is formed, in this region, a liquid crystal layer is made thin and the longitudinal electric field is strengthened, and the effect of the transverse electric field is suppressed.</p>
申请公布号 JP2001142414(A) 申请公布日期 2001.05.25
申请号 JP19990323928 申请日期 1999.11.15
申请人 SEIKO EPSON CORP 发明人 YONEYAMA RYOICHI
分类号 G09F9/30;G02F1/1333;G02F1/136;G02F1/1368;H01L29/786;(IPC1-7):G09F9/30;G02F1/133 主分类号 G09F9/30
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