| 摘要 |
<p>A method and apparatus for enabling the formation of a carbonaceous hard film having a high hardness, strong adherence to the substrate, a wide range of substrate compatibility, and structural stability, which can be formed at room temperature and may have a larger area. In a method for vapor depositing a hard film of a carbonaceous material onto a substrate under vacuum decompression, a vaporized carbonaceous material, which may be ionized or non-ionized, is deposited onto the substrate surface, and gas cluster ions, generated by ionizing gas clusters, are irradiated to form the film.</p> |
