CHAMBER FOR REDUCING CONTAMINATION DURING CHEMICAL VAPOR DEPOSITION,申请号KR1020007010793-传众专利搜索

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发明名称	CHAMBER FOR REDUCING CONTAMINATION DURING CHEMICAL VAPOR DEPOSITION
摘要
申请公布号	KR20010042259(A)	申请公布日期	2001.05.25
申请号	KR1020007010793	申请日期	2000.09.28
申请人		发明人
分类号	C23C16/00	主分类号	C23C16/00
代理机构		代理人
主权项
地址

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