| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive photoresist composition which ensures improved balance between the dense and coarse patterns of a resist pattern and improved line edge roughness. SOLUTION: The positive photoresist composition contains (a) a copolymer A having structural units of formulae I-III (where R1 and R2 are each H or methyl; R3 is tertiary alkyl; R1' and R2' are each H or a 1-4C alkyl; and R3' is linear or cyclic alkyl, aryl or aralkyl), (b) a compound which generates an acid when irradiated with active light or radiation and (c) a solvent. |
